On February 6, Goertek announced on its official Weibo account that its subsidiary, Goertek Optics, recently launched the StarG-E1, a new AR full-color optical waveguide display module using a surface relief etching grating process, at the SPIE (International Society for Optical Engineering) AR|VR|MR conference in the United States, achieving a new breakthrough in advanced etching processes for AR optical lenses.
Goertek announced that the StarG-E1 module uses high-refractive-index materials and surface relief etching grating technology, which has the characteristics of "high uniformity, high brightness, and low stray light", and can maintain "clear and comfortable display effect" even in bright light environments.
Image source: Goertek
According to the announcement, this process breaks through the bottleneck of traditional nanoimprint technology in the application of high refractive index materials, providing a wider range of refractive index options while possessing stronger UV resistance. Through optimized grating materials and structure, StarG-E1 achieves a peak brightness of 5000 nits. Its brightness uniformity exceeds 45%, and its color difference is less than 0.02, representing improvements of approximately 50% and 100% respectively compared to similar technologies, reducing image color deviation and enhancing color performance.
In addition, StarG-E1 uses a single-layer optical waveguide lens with a thickness of 0.7 mm and adopts a MicroLED display solution, with an optical engine volume of less than 0.5 cubic centimeters.
